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在深紫外LIGA加工中,制作高精度大高宽比的微器件是很困难的。难点在于SU-8光刻胶对紫外光的吸收系数随着波长变短而很快变大,而且其穿透深度也相应迅速变小;同时由于紫外光的衍射效应,获得高精度的大高宽比结构并不容易。本文深入研究了影响紫外深度光刻图形转移精度的如下因素:衍射效应、曝光剂量、紫外光波长和蝇眼透镜的分布等等。建立了基于模型区域的校正系统,该校正系统采用了分类分区域的思想将掩模图形按其畸变的特点进行了分类,在校正过程中对不同的类别分别建立校正区域,在每一校正区域内进行校正优化处理和校正评价,这种基于模型的分类分区域评价思想,使得校正过程有效且实时,该校正方法不仅降低了校正的复杂性,同时提高了校正的效率。
In deep UV LIGA processing, it is difficult to make micro devices with high precision and high aspect ratio. The difficulty is that the UV absorption coefficient of SU-8 photoresist quickly increases as the wavelength becomes shorter, and the penetration depth of the SU-8 photoresist also decreases rapidly. Meanwhile, due to the diffraction effect of UV light, a high-precision high height Aspect ratio structure is not easy. In this paper, the following factors that affect the accuracy of UV deep lithography transfer are studied in detail: diffraction effect, exposure dose, UV wavelength and the distribution of fly-eye lens. A calibration system based on model region was established. The calibration system adopted the idea of classifying subareas to classify the mask images according to the characteristics of their distortions. In the process of calibration, calibration regions were respectively established for different categories. In each calibration region This model-based classification sub-region evaluation idea makes the correction process effective and real-time, which not only reduces the complexity of the correction, but also improves the efficiency of the correction.