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用单源低能氩离子束辅助沉积（ＩＢＡＤ）法制备了非晶碳薄膜．氩离子能量为４００－１５００ｅＶ．膜面光滑致密，与衬底的结合力较高。用Ｒａｍａｎ，ＦＴＩＲ，ＨＲＴＥＭ，ＴＥＤ，ＳＥＭ，ＥＲＤ及ＲＢＳ研究了薄膜的形貌、结构和组分，测量了膜的电阻率、显微硬度及摩擦系数．薄膜为无定形的类金刚石（ＤＬＣ）．其中含氢约为２０５ａｔ．－％，碳原子与氢原子几乎没有形成Ｃ－Ｈ键．随着离子束能量及束流的增加，显微硬度、摩擦系数增加，电阻率减小．硬度增加是由于薄膜致密度的增加，而电阻率降低是由于膜中金刚石键（ｓｐ~３键）含量减少的缘故．
An amorphous carbon film was prepared by single source low energy argon ion beam assisted deposition (IBAD) method. Argon ion energy is 400-1500 eV. Membrane surface smooth and dense, high binding force with the substrate. The morphology, structure and composition of the films were investigated by Raman, FTIR, HRTEM, TED, SEM, ERD and RBS. The resistivity, microhardness and friction coefficient of the films were measured. The film is amorphous diamond-like (DLC). Hydrogen is about 205at. -%, almost no C-H bond is formed between a carbon atom and a hydrogen atom. With the increase of ion beam energy and beam current, the microhardness, the friction coefficient and the resistivity decrease. The increase in hardness is due to an increase in the density of the film, and the decrease in resistivity is due to a decrease in the content of diamond bonds (sp ~ 3 bonds) in the film.