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研究了与偏二溴乙烯(VDBr,M_1)共聚的不同单体(M_2)——丙烯酸甲酯(MA)、甲基丙烯酸甲酯(MMA)和苯乙烯(St)的性质和共聚物的序列分布对记录材料紫外光敏性的影响。结果表明,含St的紫外光敏性最高,含MA的较差。对同一类共聚物记录材料而言,光敏性与共聚物的序列分布,主要是P_2(M_1M_2)有对应关系。本文还报道了VDBr与MA、MMA及St在55±0.2℃以偶氮二异丁腈为引发剂的自由基共聚反应竞聚率(r)分别为,VDBr-MA:r_1=0.72±0.05,r_1=0.72±0.05;VDBr-MMA:r_1=0.50±0.04,r_2=1.74±0.04;VDBr-St:r_1=0.40±0.04,r_2=1.12±0.04。
The properties and copolymers of different monomers (M_2) - methyl acrylate (MA), methyl methacrylate (MMA) and styrene (St) copolymerized with vinylidene bromide (VDBr, M_1) Effect of Distribution on UV Photosensitivity of Recording Materials. The results show that the UV-sensitive St with the highest MA-containing poor. For the same type of copolymer recording material, the photosensitivity and the copolymer sequence distribution, mainly P_2 (M_1M_2) have a corresponding relationship. It is also reported here that the reactivity ratios (r) of VDBr with MA, MMA and St at 55 ± 0.2 ℃ using azobisisobutyronitrile as initiator are respectively VDBr-MA: r 1 = 0.72 ± 0.05, r_1 = 0.72 ± 0.05; VDBr-MMA: r_1 = 0.50 ± 0.04, r_2 = 1.74 ± 0.04; VDBr-St: r_1 = 0.40 ± 0.04, r_2 = 1.12 ± 0.04.