论文部分内容阅读
化学气相沉积法（ｃｈｅｍｉｃａｌｖａｐｏｒｄｅｐｏｓｉｔｉｏｎｍｅｔｈｏｄ简称ＣＶＤ法）可对１３Ｘ分子筛进行孔径修饰，并用于含重金属离子废水的净化处理。研究结果表明，随１３Ｘ分子筛外表面ＳｉＯ２沉积量的增加，孔径收缩。用经ＣＶＤ法处理的１３Ｘ分子筛净化含重金属离子水溶液时，发现吸附Ｃｕ（Ⅱ）、Ｃｄ（Ⅱ）的能力提高，吸附Ｃｒ（Ⅵ）的能力降低；在Ｃｕ（Ⅱ）—Ｃｄ（Ⅱ）—Ｃｒ（Ⅵ）混合溶液中，可优先吸附Ｃｕ（Ⅱ）、Ｃｄ（Ⅱ）离子。
Chemical vapor deposition (chemicalvapordepositionmethod referred to as CVD method) 13X molecular sieve pore size modification, and for the purification of wastewater containing heavy metal ions. The results show that the pore size shrinks with the increase of SiO2 deposition on the outer surface of 13X molecular sieve. The capability of adsorbing Cu (Ⅱ) and Cd (Ⅱ) increased and the ability of adsorbing Cr (Ⅵ) decreased when 13X molecular sieve treated by CVD method was used to purify aqueous solution containing heavy metal ions. Cr (Ⅵ) mixed solution, preferential adsorption of Cu (Ⅱ), Cd (Ⅱ) ions.