Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition

来源 :微电子制造学报 | 被引量 : 0次 | 上传用户：bm_imba

【摘要】

：

Thin film deposition is one of the most important processes in IC manufacturing. In this paper, several typical models and numerical simulation methods for thin

【作者】

：

Lei Qu Rui Chen Xiaoting Li Ji

【机构】

：

NorthChinaUniversityofTechnology,KeyLaboratoryofMicroelectronicDevices&,IntegratedTechnology

【出处】

：

微电子制造学报

【发表日期】

：

2019年2期

【关键词】

：

THIN film DEPOSITION ATOMIC LAYER DEPOSITION growth MODEL prediction MODEL simul

【基金项目】

：

Beijing Natural Fund 4182021,the National Natural Science Foundation of China 61874002,the School of Information Science and Technology of North China University of Technology (NCUT) for financial sup

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Thin film deposition is one of the most important processes in IC manufacturing. In this paper, several typical models and numerical simulation methods for thin film deposition and atomic layer deposition are introduced. Several modeling methods based on

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