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讨论了激光退火工艺参量对镱铒共掺Al2O3薄膜表面形貌和退火均匀性的影响。薄膜样品被置放于衰减扩束透镜的3倍焦距位置时,薄膜上8 mm半径区域内近似均匀退火;退火时间为32 s时,表面形貌与退火前基本相同。阈值退火功率为5 W,最佳退火功率为20 W。对相同工艺制备的镱铒共掺Al2O3薄膜分别进行CO2激光退火和热退火处理,光致发光(PL)谱测量表明,前者峰值强度比后者强10倍以上,并且热退火光致发光强度随抽运功率增加出现饱和、下降,而激光退火近似随抽运功率单调线性增强。
The effects of laser annealing process parameters on the morphology and annealing uniformity of Yb-erbium-doped Al2O3 films were discussed. When the film sample is placed in the focal length of 3 times of the attenuation expander lens, the surface of the film is approximately uniformly annealed in the radius of 8 mm on the film surface. When the annealing time is 32 s, the surface morphology is basically the same as that before annealing. The threshold annealing power is 5 W and the optimum annealing power is 20 W. The Yb-erbium co-doped Al2O3 films prepared by the same process were respectively subjected to CO2 laser annealing and thermal annealing. The photoluminescence (PL) spectra showed that the former peak intensity was more than 10 times stronger than that of the latter, and the photoluminescence intensity The increase in pumping power appears saturated, declining, while laser annealing approximately monotonically increases linearly with pumping power.