采用反应磁控溅射制备了AlN VN纳米多层膜 .研究了多层膜调制周期对AlN生长结构的影响以及纳米多层膜的力学性能 .结果表明 :小周期多层膜中的AlN以亚稳的立方相 (c AlN)存在并与VN形成共格外延生长的超晶格 .薄膜产生硬度和弹性模量升高的超硬效应 .大调制周期下 ,AlN从立方结构转变为稳定的六方相 (h AlN) ,并使多层膜形成纳米晶的“砖墙”型结构 .讨论认为VN的模板作用有利于c AlN的生长 ,但不能显著提高其临界厚度 The AlN VN multilayered films were prepared by reactive magnetron sputtering.The effect of the modulation period of multilayered films on the growth structure of AlN and the mechanical properties of the nano-multilayered films were investigated.The results show that the AlN in the multilayered films is The stable cubic phase (c AlN) exists and forms a superlattice that grows coextensive with VN. The film produces a superhard effect of increased hardness and modulus of elasticity. In a large modulation period, AlN transitions from a cubic structure to a stable hexagonal (H AlN), and make the multilayer film form a “brick wall” type structure of nanocrystal.The discussion suggests that the template effect of VN is beneficial to the growth of c AlN, but it can not significantly increase its critical thickness