论文部分内容阅读
随着现代工业和科学技术的飞速发展,特别是近代大规模集成电路技术的不断提高,对系统精度的要求日益提高。在光刻系统中,越来越短的特征尺寸要求我们使用更高精度的光刻物镜。在这之前我们需要更高精度的检测技术来满足加工及系统集成的需要。高精度移相干涉仪的测量结果包含了待测面和参考面的误差,移相干涉测量法的测量精度受限于参考面的精度。绝对测量方法通过移除参考面的误差,从而达到提高测量精度的目的。回顾了光学平面面形绝对测量方法,重点描述了基于奇偶函数的绝对测量方法。分析了旋转角度误差对测量结果的影响,通过旋转更小的角度求出了高阶面形拟合分量,给出了求高阶面形拟合分量的通项公式。
With the rapid development of modern industry and science and technology, especially in modern large scale integrated circuit technology, the requirements for system accuracy are increasing day by day. In photolithography systems, shorter and shorter feature sizes require us to use more precise lithography objectives. Before that we needed more sophisticated inspection techniques to meet the needs of machining and system integration. The measurement results of the high-precision phase-shifting interferometer include the error between the test surface and the reference surface. The measurement accuracy of the phase-shift interferometry method is limited by the accuracy of the reference surface. Absolute measurement method by removing the reference surface error, so as to achieve the purpose of improving the measurement accuracy. The absolute measurement method of optical flat surface is reviewed, and the absolute measurement method based on the odd and even functions is mainly described. The influence of the rotation angle error on the measurement results is analyzed. The high-order surface shape fitting component is obtained by rotating a smaller angle, and the general formula for finding the high-order surface shape fitting component is given.