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用低O_2,低CO_2、光强269μE·m~(-2)·s(-1)的人工光氧化条件处理水稻叶片,观察了不同耐光特性品种叶片的光合速率、叶绿素含量及其组份和活性氧清除系统的差异。结果表明,不同光氧化耐性的水稻品种比较,以耐光氧化的品种受影响较小。光氧化条件下叶片活性氧清除系统中的超氧物歧化酶、过氧化物酶活性及类胡萝卜素和抗坏血酸水平降低,而膜脂过氧化作用加强。处理4～8天,不同品种间以耐光氧化品种的保护酶活性、抗光氧化物质水平下降及丙二醛含量上升的幅度较小。
The photosynthetic rate, chlorophyll content and the contents of chlorophyll in leaves of different light-tolerant cultivars were observed under artificial photooxidation conditions with low O_2, low CO_2 and light intensity of 269μE · m -2 · s -1 Active oxygen scavenging system differences. The results showed that the varieties with different photosoxidative tolerance were less affected by light-tolerant oxidation. Under photooxidation conditions, the activity of superoxide dismutase, peroxidase and the levels of carotenoids and ascorbate in active oxygen scavenging system of leaves were decreased, while the lipid peroxidation was enhanced. When treated for 4-8 days, the activities of protective enzymes, the level of anti-photo-oxidative substances and the increase of malondialdehyde content of the varieties resistant to light were relatively small.