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近年来，铁电薄膜制备技术的迅速发展使得人工介电超晶格的生长成为现实。简要介绍了有关介电多层膜和人工介电超晶格的制备、结构和性能的研究状况，讨论了进一步研究需解决的问题。
In recent years, the rapid development of ferroelectric thin film fabrication technology has made the growth of artificial dielectric superlattices a reality. The research status of the preparation, structure and properties of dielectric multilayered films and artificial dielectric superlattices are briefly introduced. The problems to be solved in further research are discussed.