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对无抑制剂取向硅钢不同压下率下初次再结晶退火后的显微组织、宏观织构和微观织构进行了研究。结果表明,冷轧板织构主要为α取向线{001}<110>、{112}<110>和{111}<110>织构以及γ取向线{111}<110>织构。初次再结晶退火后,α取向线织构减弱,织构主要为γ取向线{111}<112>织构。随冷轧压下率的增加,冷轧和初次再结晶织构强度增加。当压下率为88%时,初次再结晶退火后Goss织构和{111}<112>织构强度最高,最有利于发生二次再结晶。EBSD分析显示,Goss取向晶粒大多与{111}<112>取向晶粒相邻。提高冷轧压下率,Goss取向晶粒和{111}<112>取向晶粒都增加,Goss取向晶粒偏离理想取向角度减少。
The microstructure, macro-texture and micro-texture of uninhibited-oriented silicon steel after primary recrystallization annealing at different reduction rates were studied. The results show that the texture of the cold-rolled sheet is mainly composed of {001} <110>, {112} <110> and {111} <110> and γ-oriented {111} <110> texture. After the first recrystallization and annealing, the texture of α-orientation line weakened, and the texture mainly consisted of γ-orientation line {111} <112> texture. Cold rolling and primary recrystallization texture strength increase with increasing cold rolling reduction. When the reduction ratio is 88%, the Goss texture and the {111} <112> texture intensity are the highest after the first recrystallization annealing, which is most favorable for secondary recrystallization. EBSD analysis showed that most of Goss orientation grains were adjacent to {111} <112> orientation grains. With increasing the rolling reduction, both the Goss orientation grains and the {111} <112> orientation grains increase, and the Goss orientation grains deviate from the ideal orientation angle.