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研制了一种工作在 1 5 5 0nm波长范围内的单模光纤微机械可调式光衰减器。该衰减器利用非硅表面微加工工艺 (这种工艺采用光致抗蚀剂和溅射铜薄膜作为牺牲层 ,电镀铁镍层作为结构层来制作MEMS元件 )制作 ,由电镀铁镍层构成的一个插在两对准光纤空隙中的挡光片 ,一个平面电感线圈 ,一个硅弹簧和二个带有V型槽的光纤对准元件构成。电镀铁镍制作的挡光片被固定在一个硅弹簧上 ,该挡光片采用非硅表面微加工工艺制作 ,平面电感线圈利用高深宽比的光刻工艺和掩蔽电镀工艺制作 ,硅弹簧和光纤对准元件采用反应离子刻蚀和硅的各向异性腐蚀工艺制作。
A kind of single-mode optical fiber micromechanical tunable optical attenuator working at a wavelength of 1550 nm has been developed. The attenuator is made of a non-silicon surface micro-fabrication process using a photoresist and sputtered copper film as a sacrificial layer and an electroplated iron-nickel layer as a structural layer to fabricate a MEMS device. The attenuator is made of an electroplated iron-nickel layer A light barrier inserted in the gap between the two alignment fibers, a planar inductor, a silicon spring and two fiber alignment elements with V-grooves. The iron-nickel electroplated iron plate is fixed on a silicon spring. The light-blocking plate is made of non-silicon surface micro-fabrication process. The flat-plate induction coil is made of high aspect ratio photolithography and masking electroplating process. The silicon spring and fiber Alignment components using reactive ion etching and silicon anisotropic etching process.