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介绍用直流平面磁控溅射方法制备掺铝的氧化锌透明导电薄膜并研究了其特性，阐述了金属氧化物透明导电薄膜研究的发展情况及其应用前景，并讨论了氧化锌掺铝薄膜的优点。介绍了ZnO∶Al薄膜的制备情况：靶的制备及薄膜的制备过程。测量了薄膜的光电特性，包括透射比、折射率、消光系数、方块电阻、电阻率、载流子浓度和迁移率等参数，并分析了各种实验条件对薄膜性能的影响。
This paper introduces the preparation of aluminum-doped zinc oxide transparent conductive film by direct current planar magnetron sputtering and its properties. The development of the transparent conductive metal oxide film and its application prospects are also discussed. The effects of zinc oxide doping with aluminum thin film advantage. The preparation of ZnO:Al film is introduced: the preparation of the target and the preparation process of the film. The photoelectric properties of the films were measured, including transmittance, refractive index, extinction coefficient, sheet resistance, resistivity, carrier concentration and mobility. The effects of various experimental conditions on the properties of the films were also analyzed.