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利用射频反应磁控溅射方法,制备了调制比约为4,调制周期不同的一系列TiN/ZrN纳米多层膜.利用X射线衍射仪(XRD)、高分辨电子显微镜(HRTEM)和纳米压痕仪(Nanoindentation)对多层膜的调制结构、界面状态和力学性能进行了表征.研究结果表明TiN/ZrN多层膜具有很好的调制结构,但是在TiN层和ZrN层之间存在一定厚度的界面混合层.力学性能分析表明:当调制周期小于15nm时,TiN/ZrN多层膜的硬度介于单一TiN和ZrN薄膜的硬度之间;当调制周期为15·24nm时,硬度达到最大,但随着调制周期增加,多层膜的硬度基本上保持为常数.分析了TiN/ZrN多层膜硬度变化的机制,认为界面厚度和择优取向是导致硬度变化的主要原因.
A series of TiN / ZrN multilayered films with modulation ratio of about 4 and different modulation period were prepared by RF reactive magnetron sputtering.The structures of the films were characterized by X-ray diffraction (XRD), high resolution electron microscopy (HRTEM) The structure, interface state and mechanical properties of multilayer films were characterized by Nanoindentation.The results show that TiN / ZrN multilayer films have good modulation structure, but there is a certain thickness between TiN layer and ZrN layer The mechanical properties show that the hardness of TiN / ZrN multilayers is between that of single TiN and ZrN films when the modulation period is less than 15nm, and reaches the maximum when the modulation period is 15 · 24nm, However, with the increase of the modulation period, the hardness of the multilayers remained basically constant.The mechanism of the hardness changes of the TiN / ZrN multilayers was analyzed, and the thickness and preferred orientation of the TiN / ZrN multilayers were considered as the main causes of the hardness changes.