电子显微镜经过五十多年的发展,目前的性能已经达到:空间点分辨率优于0.2nm,微衍射和微分析的空间分辨率优于2nm.利用这些性能,电子显微学得到了广泛的发展[1].本文要介绍的是近十年来表面和界面电子显微学的进展. 表面电子显微学的发展是和超高真空技术的普及分不开的.比较简 After more than 50 years of development, the current performance of the electron microscope has been reached: the resolution of the spatial point is better than 0.2nm, and the spatial resolution of micro-diffraction and micro-analysis is better than 2nm. With these properties, electron microscopy has been widely used Development [1] .This article describes the progress of surface and interface electron microscopy in the past decade. The development of surface electron microscopy is inseparable from the popularity of ultra-high vacuum technology.