论文部分内容阅读
以TiCl4和NH3为原料,用常压化学气相沉积法在玻璃基板表面沉积得到了TiN薄膜。采用X射线衍射、场发射扫描电子显微镜、电阻仪、紫外-可见光谱仪等研究了喷涂距离(输入TiCl4管道末端到基板之间的距离)对沉积的TiN薄膜的结晶性能和表面形貌,以及薄膜的电学性能和光学性能的影响。结果表明:当喷涂距离为5cm和10cm时,玻璃基板表面形成电阻较高、反射率较低的较疏松薄膜。当喷涂距离增加到13cm和15cm时,可以得到结晶良好、低电阻、高反射、致密的TiN薄膜。当喷涂距离进一步增加到20cm以上,得到的薄膜的电阻率随之升高而反射率下降。对喷涂距离对薄膜性能的影响机理进行了分析,认为喷涂距离的变化会影响扩散到达并吸附在基板表面的反应物分子数量比例,进而影响沉积薄膜的性能。
With TiCl4 and NH3 as raw materials, the TiN film was deposited on the glass substrate by atmospheric pressure chemical vapor deposition. X-ray diffraction, field emission scanning electron microscopy, electrical resistance spectroscopy, UV-Vis spectroscopy and other study of the spray distance (input TiCl4 pipe end to substrate distance between) on the deposited TiN film crystallization performance and surface morphology, and the film The electrical and optical properties of the impact. The results show that when the spraying distance is 5cm and 10cm, the surface of the glass substrate forms a more loose film with higher electrical resistance and lower reflectivity. When the spraying distance is increased to 13cm and 15cm, TiN film with good crystallinity, low resistance, high reflection and compactness can be obtained. When the spraying distance is further increased to more than 20cm, the resistivity of the obtained film increases and the reflectance decreases. The influence mechanism of spraying distance on film performance was analyzed. It was considered that the change of spraying distance will affect the proportion of reactant molecules which diffused and adsorbed on the substrate surface, which will affect the performance of deposited films.