软刻蚀是一类基于自组装和复制模塑等原理的非光刻微米和纳米加工方法。它为形成和制作微米、纳米图案提供了简便、有效、价廉的途径。在软刻蚀中 ,用一个表面带图案的弹性模板来实现图案的转移 ,其加工的分辨率可达 3 0nm～ 1 0 0 μm。软刻蚀是微接触印刷、复制模塑、转移微模塑、毛细微模塑、溶剂辅助微模塑等的总称。本文将简介软刻蚀的原理、方法以及它们在微米和纳米加工、微电子学、材料科学、光学、微电子机械系统、表面化学等方面的应用。 Soft etching is a class of non-lithographic and nano-fabrication methods based on the principles of self-assembly and replication molding. It provides a simple, effective and inexpensive way to form and make micron and nano patterns. In soft etching, pattern transfer is achieved with a patterned elastic template with a processing resolution of 30 nm to 100 μm. Soft etching is micro-contact printing, copy molding, transfer micro-molding, capillary micro-molding, solvent-assisted micro-molding, etc. in general. This article will introduce the principles and methods of soft etching and their applications in micro- and nano-fabrication, microelectronics, materials science, optics, microelectromechanical systems, and surface chemistry.