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本实验是在低温条件下,采用电子束蒸发制备ITO透明导电薄膜,通过监测电阻来控制薄膜的厚度,通过控制薄膜厚度研究了增透和增反两种效果的ITO膜的制备及膜的光学特性。当膜厚达170 nm和83 nm时透过率和反射率可达95%和6%。
In this experiment, the ITO transparent conductive film was prepared by electron beam evaporation at low temperature, the thickness of the film was controlled by monitoring the resistance, and the preparation of the ITO film with both increasing and increasing effects was studied by controlling the thickness of the film. characteristic. Transmittance and reflectivity up to 95% and 6% at 170 nm and 83 nm.