本文研究了采用SF_6进行等离子体刻蚀的工艺,着重讨论了负载效应和压力对腐蚀速率的影响.对负载效应的研究发现Si有较明显的负载效应,而SiO_2和Si_3N_4基本没有负载效应.影响其负载效应的主要因素是腐蚀速率.改变压力腐蚀Si时发现,压力对腐蚀速率的影响使腐蚀速率出现峰值,在简单的假设条件下推导出统一物理模型可分别解释上述现象,对实验数据的处理发现与理论公式基本吻合. In this paper, the process of plasma etching using SF_6 is studied, and the effect of load and pressure on the corrosion rate is mainly discussed.It is found that there is a more obvious load effect on Si and less on Si_2 and Si_3N_4. The main factor of the load effect is the corrosion rate.It is found that the effect of pressure on the corrosion rate leads to the peak corrosion rate when the pressure is changed and the uniform physical model can be deduced under the simple assumption.These phenomena can be explained by the experimental data The treatment found basically consistent with the theoretical formula.