A set of a-SiOx :H (0.52 <x<1.58) films are fabricated by plasma-enhanced-chemical-vapor-deposition (PECVD) method at the substrate temperature of 250℃. The micr
A material model, whose framework is parallel spring-bundles oriented in 3-D space, is proposed. Based on a discussion of the discrete schemes and optimum discretization of the solid angles, a 3-D net
We prove that the nonlinear Schrodinger equation of attractive type (NLS+ describes just spher-ical surfaces (SS) and the nonlinear Schrodinger equation of repu