多取代巴比妥酸系列衍生物三阶非线性光学性质的理论研究及分子设计

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在ZINDO方法基础上,按完全态求和(SOS)公式编制了计算三阶非线性光学系数γijkl的程序,研究了多取代巴比妥酸系列衍生物分子的结构,光谱和三阶非线性光学系数γ(-ω;-ω,ω,ω) , γ(0;0,0,0). 除了通常的D-π-A结构外, 还研究了D-A-D结构. 对这些NLO生色团分子的结构与三阶NLO性质的关系给予系统的理论研究. 考察了给体, 桥, 受体变化, D-π-A结构及D-A-D结构对γ的影响, 结论是:1.氧代巴比妥酸受体三阶NLO系数高于硫代巴比妥酸受体. 2.芳基给体取代基与烷基给体取代基相比, 不仅热稳定性高于后者, 而且γ值亦高于后者, 从而设计了一系列有实际应用价值的热稳定性好、有优良非线性光学性质的分子.
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