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利用直流磁控溅射法在金刚石颗粒表面沉积了厚度为150nm的金属Cr薄膜。SEM研究表明在金刚石表面形成的Cr膜基本均匀,但有小的金属聚集体存在。俄歇深度剖析研究发现,在镀膜过程中Cr膜和金刚石基底间发生了显著的界面扩散作用。相应的俄歇线形分析表明,沉积过程中在界面上发生化学反应形成了部分Cr2C3物种。溅射沉积功率对金刚石颗粒与金属Cr膜的界面扩散反应有较大的影响。提高溅射功率可大大促进Cr元素的扩散,但对于C元素的扩散作用则影响较小。界面扩散反应的本质是荷能Cr原子与金刚石基底的碰撞注入作用。
A Cr film with a thickness of 150 nm was deposited on the surface of diamond particles by DC magnetron sputtering. SEM studies show that the Cr film formed on the diamond surface is substantially uniform, but small metal aggregates are present. Auger depth analysis of the study found that in the coating process Cr film and diamond substrate significant interface diffusion occurred. The corresponding Auger linear analysis shows that some Cr2C3 species are formed by chemical reaction at the interface during deposition. Sputtering deposition power has a great influence on the interfacial diffusion reaction between diamond particles and metal Cr film. Increasing the sputtering power can greatly promote the diffusion of Cr element, but it has less effect on the diffusion of C element. The essence of interfacial diffusion reaction is the collisional injection of charged Cr atoms into the diamond substrate.