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[期刊论文] 作者：XU Jun,GAO Peng,DING Wan-yu,LI,
来源：材料热处理学报 年份：2004
Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources...
,Influence of O2 Flux on Compositions and Properties of ITO Films Deposited at Room Temperature by D
[期刊论文] 作者：WANG Hua-Lin,DING Wan-Yu,LIU Chao-Qian,CHAI Wei-Ping,
来源：中国物理快报(英文版) 年份：2010
Indium tin oxide(ITO)films were deposited on glass substrates at room temperature by dc pulse magnetron sputtering.Varying O2 flux,ITO films with different prop...
,Ultra-Thin Silicon Carbon Nitride Film: a Promising Protective Coating for Read/Write Heads in Magn
[期刊论文] 作者：GAO Peng,XU Jun,DING Wan-Yu,DONG Chuang,
来源：中国物理快报（英文版） 年份：2009
Ultra-thin amorphous Si-C-N films,down to 2nm,have been synthesized by MW-ECR plasma enhanced unbalanced magnetron sputtering.The friction coefficient of the fi...
[期刊论文] 作者：Ding Wan-Yu,徐军,Lu Wen-Qi,邓新绿,D,
来源：物理学报 年份：2004
利用微波电子回旋共振增强磁控反应溅射法在不同基片温度下制备无氢SiNx薄膜.通过傅里叶变换红外光谱、透射电子显微镜、台阶仪、纳米硬度仪等表征技术,研究了基片温度对SiNx...
[期刊论文] 作者：Ding Wan-Yu,Xu Jun,Lu Wen-Qi,Deng Xin-Lu,Dong Chuang,
来源：中国物理B（英文版） 年份：2009
This paper reports that amorphous silicon nitride(a-SiNx)overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sput...
,Deposition of Hydrogen-Free Silicon Nitride Thin Films by Microwave ECR plasma Enhanced Magnetron S
[期刊论文] 作者：DING Wan-Yu,XU Jun,PIAO Yong,LI Yan-Qin,GAO Peng,DENG Xin-Lu,DONG Chuang,
来源：中国物理快报（英文版） 年份：2005
Hydrogen-free silicon nitride (SiNx)films were deposited at room temperature by microwave electron cyclotron resonance (MW-ECR) plasma enhanced unbalance magnet...
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