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,Electrical Characterization of Metal-Insulator-Metal Capacitors with Atomic-Layer-Deposited HfO2 Di
[期刊论文] 作者：HUANG Yu-Jian,HUANG Yue,DING Shi-Jin,ZHANG Wei,LIU Ran,
来源：中国物理快报（英文版） 年份：2007
Metal-insulator-metal (MIM) capacitors with atomic-layer-deposited HfO2 dielectric and TaN electrodes are investigated for rf integrated circuit applications. F...
,High density Al2O3/TaN-based metal-insulator metal capacitors in application to radio frequency int
[期刊论文] 作者：Ding Shi-Jin,Huang Yu-Jian,Huang Yue,Pan Shao-Hui,Zhang Wei,Wang Li-Kang,
来源：中国物理（英文版） 年份：2007
Metal-insulator-metal (MIM) capacitors with atomic-layer-deposited A12O3 dielectric and reactively sputtered TaN electrodes in application to radio frequency in...
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