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[期刊论文] 作者：CHEN De-Liang,CAO Yi-Ping,HUANG Zhen-Fen,
来源：中国物理快报（英文版） 年份：2011
The Kirk test has good precision for measuring stray light in optical lithography and is the usual method of measuring stray light.However, Kirk did not provide...
,Optimum design of photoresist thickness for 90-nm critical dimension based on ArF laser lithography
[期刊论文] 作者：Chen De-Liang,Cao Yi-Ping,Huang Zhen-Fen,Lu Xi,Zhai Ai-Ping,
来源：中国物理B（英文版） 年份：2012
In this work,a 90-nm critical dimension (CD) technological process in an ArF laser lithography system is simulated,and the swing curves of the CD linewidth chan...
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