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[会议论文] 作者：Lan Chen,Idriss Blakey,Bronwin Dargaville,Heping Liu,Andrew K.Whittaker,Paul A.Zimmerman,
来源：第四届光响应有机和高分子材料国际会议(4th International Conference on Photoresp 年份：2008
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[会议论文] 作者：Idriss Blakey,Ya-Mi Chuang,Han-Hao Cheng,Imelda Keen,Anguang Yu,Kevin S.Jack,Michael J.Leeson,Todd R.Younkin,
来源：International Conference on Nanoscience & Technology,China 2 年份：2013
Fabrication of ordered nanoseale structures is crucial for the manufacture of integrated circuits (CPUs RAM etc), next generation hard drives and metamaterials.Top down optical lithography techniques...
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