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[期刊论文] 作者：HUANG Rui,LIN Xuan-Ying,YU Yun-Peng,LIN Kui-Xun,WEI Jun-Hong,YU Chu-Ying,WANG Zhao-Kui,
来源：中国物理快报（英文版） 年份：2004
We report the discovery of fast growth of polycrystalline silicon films under low temperature of 200-300 C from SiCl4/H2 mixture gases by plasma enhanced chemic...
,The reliability of measurements on electron energy distribution function in silane rf glow discharg
[期刊论文] 作者：Lin Kui-Xun(林揆训),Lin Xuan-Ying(林璇英),Chi Ling-Fei(池凌飞),Yu Chu-Ying(余楚迎),Yao Ruo-He(姚若河),Yu Yun-Peng(余云鹏,
来源：中国物理（英文版） 年份：2003
Electron energy distribution function (EEDF) is a key parameter of plasmas, which is directly proportional to the second derivative of the probe I-V characteris...
,Low-Temperature Growth of Polycrystalline silicon Films by SiCl4/H2 rf Plasma Enhanced Chemical Vap
[期刊论文] 作者：LIN Xuan-Ying(林璇英),HUANG Chuang-Jun(黄创君),LIN Kui-Xun(林揆训),YU Yun-Peng(余运鹏),YU Chu-Ying(余楚迎),CHI Ling-Fei,
来源：中国物理快报(英文版) 年份：2003
Polycrystalline silicon film was directly fabricated at 200℃ by the conventional plasma enhanced chemical vapour deposition method from SiCl4 with H2 dilution....
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