Europium-doped barium thioaluminate sputtering target was synthesized by powder sintering method and thin film was depos......

用高频溅射法在P型硅衬底上生长了纳米硅薄膜,衬底温度控制在95℃左右,工作气体选用H2+Ar,氢气的分压控制在31%到70%,同时改变薄膜......

采用射频溅射工艺制得细小均匀的β－Sn纳米锡膜，然后通过氧化处理工艺获得组织非常细小均匀的纳米级二氧化锡薄膜。X－衍射实验结果表......

LiMn2O4 thin films are deposited on gold coated polyimide flexible substrates using RF magnetron sputtering technique ma......