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Two decades have elapsed since we proposed,for the first time,confined etchant layer technique (CELT) as an electrochemical micro- and nano- fabrication method in 1992.Many progresses have been achieved and will be reported as followed: (1) The principle of CELT: The diffusion layer of electrochemical reaction can be compacted into a thickness of nanoscale through a subsequent homogeneous chemical reaction.Etchant is confined in the "compact" layer and the precision of nanofabrication is determined.(2)Fabrication of 3D nanostructures: CELT has been proved an effective method for 3D nanostructures on the surface of metals,semiconductors and insulates.The 8-phase AsGa microlens array made by CELT has a height of 180 nm for each phase.Recently,we develop an "electrochemical buckling nanofabrication" method which can perform multistage and multiscale micro & nano 3D structure.(3)Supersmooth surface polishing: Recently,we develop CELT as polishing method to produce supersmooth surface with a Ra of nanometres by replacing the 3D mask electrode with a nanometer-smoothed tool electrode.(4)Electrochemical mechanical micromachining: Based on the principles of CELT and combining with mechanical machining,we can realize the conventional cutting techniques,such as lathing,milling,planing and polishing in an electrochemical way.(5)CELT instrumentation: We designed the machine tool especially for CELT nanofabrication.For example,we develop a novel substrate levelling method based on the current feedback mode of scanning electrochemical microscopy,thus,solved the levelling and alignment between the electrochemical tool and the workpiece.