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论文对合肥同步辐射光源开展深度X 射线光刻进行了理论模拟 .利用Gauss积分法研究了菲涅耳衍射对深度光刻图形精度的影响 .为了模拟衬底产生的光电子对光刻结果的影响 ,构建了一个MonteCarlo模型并进行了模拟 .计算结果表明 ,合肥光源深度光刻的图形精度较高
In this paper, the depth X-ray lithography of Hefei synchrotron radiation source is theoretically simulated.The effects of Fresnel diffraction on the accuracy of deep lithography pattern are studied by means of Gauss integral method.In order to simulate the influence of photoelectron produced by substrate on the lithography result, A Monte Carlo model is constructed and simulated.The calculation results show that the Hepatic light source depth lithography has a higher accuracy