溅射制备的NiTi薄膜因其在智能薄膜系统中的广泛应用而受到重视.通常情况下,溅射制备获得的NiTi薄膜是非晶.而非晶Ni-Ti薄膜没有形状记忆效应,因此要进行晶化热处理.但是,在较高温度和/或较长时间下晶化热处理时,我们发现有挥发物出来.分析结果表明其成分为Ti,在仪器的测量误差范围内,没有探测到Ni的存在.Ti的挥发导致表面腐蚀,并使薄膜的质量下降.如果假设NiTi薄膜的表面与内部组分是均匀一致的.那么,根据平衡蒸气压原理,就应该在挥发物中同时测量到Ti和Ni的成分.因此,只有弄清这个问题,才能够有目的地改进制备工艺.为获得高质量的薄膜打下基础. NiTi thin films prepared by sputtering have attracted great attention because of their wide application in intelligent thin film systems.NiTi thin films obtained by sputtering are usually amorphous and amorphous Ni-Ti thin films have no shape memory effect, However, at higher temperatures and / or longer periods of crystallization heat treatment, we found that there was volatiles out of the analysis results show that the composition of Ti, within the measurement error of the instrument did not detect the presence of Ni The volatilization of Ti results in surface corrosion and a decrease in the quality of the film, provided that the surface of the NiTi film is assumed to be uniform with the internal components.Then, based on the principle of equilibrium vapor pressure, Ti and Ni should be simultaneously measured in the volatiles Therefore, only by clarifying this problem can we purposefully improve the preparation process and lay a foundation for obtaining a high-quality film.