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本文叙述了Van der Pauw(VDP)测试结构的基本原理及测量方法。试制了七种这类的测试结构。用圆形VDP结构和匹种不同形状的十字形结构对基区、发射区的薄层电阻进行了测量,以检查扩散的均匀性,不同结构测得结果基本相符。用十字——桥结构测量了窗口的育效宽度,用平面四探针结构测量了单晶衬底的电阻率。结果说明测试结构确是监察工艺的有效工具。
This article describes the basic principles and measurement methods of the Van der Pauw (VDP) test structure. Trial production of seven such test structures. The sheet resistance of the base area and the emitter area was measured with a round VDP structure and a cross-shaped structure of the same kind and with different shapes to check the uniformity of the diffusion. The measured results of the different structures basically matched. The width of the window is measured by the cross-bridge structure, and the resistivity of the single crystal substrate is measured by the planar four-probe structure. The results show that the test structure is indeed an effective tool for monitoring the process.