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采用直流磁控溅射的方法在烧结NdFeB磁体表面沉积Al薄膜提高磁体的耐蚀性能。研究膜厚及溅射功率对薄膜结构和耐蚀性能的影响。利用SEM对Al薄膜的微观结构进行分析,并采用动态极化曲线和中性盐雾实验分析Al薄膜耐蚀性能。均匀致密的Al薄膜的形成是获得良好耐蚀性能的必要条件。在51~82 W溅射功率下制备的6.69μm的Al薄膜具有良好的耐蚀性能。
The DC magnetron sputtering method was used to deposit Al thin films on the surface of sintered NdFeB magnets to improve the corrosion resistance of the magnets. The effects of film thickness and sputtering power on the structure and corrosion resistance of the films were investigated. The microstructure of Al thin film was analyzed by SEM, and the corrosion resistance of Al thin film was analyzed by dynamic polarization curve and neutral salt spray test. The formation of a uniform and dense Al film is a necessary condition for obtaining good corrosion resistance. The 6.69μm Al film prepared under the sputtering power of 51 ~ 82 W has good corrosion resistance.