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介绍了一种利用微透镜列阵投影成像光刻的周期微纳结构加工方法。该方法采用商业打印机在透明薄膜上打印的毫米至厘米尺寸图形为掩模,以光刻胶作为记录介质,以微透镜列阵为投影物镜将掩模缩小数千倍成像在光刻胶上,曝光显影后便可制备出微米、亚微米特征尺寸的周期结构列阵。基于该方法建立了微透镜列阵成像光刻系统,并以制备800nm线宽、50mm×50mm面积的图形列阵为例,实现了目标图形的光刻成形,曝光时间仅为几十秒,图形边沿粗糙度低于100nm。该方法系统结构简单、掩模制备简易、曝光时间短;为周期微纳结构的低成本、高效率制备提供了有效途径。
A method of processing micro-nanoscopic structures using microlens array projection imaging lithography is presented. The method uses the size of a millimeter to centimeter size graphic printed on a transparent film by a commercial printer as a mask, uses a photoresist as a recording medium, and uses a microlens array as a projection objective lens to reduce the mask thousands of times onto a photoresist, After exposure and development can be prepared micron, submicron feature size periodic array structure. A microlens array imaging lithography system was established based on this method. Taking the array of 800nm line width and 50mm × 50mm area as an example, the lithography of the target pattern was realized, the exposure time was only tens of seconds, and the pattern Edge roughness below 100nm. The method has the advantages of simple system structure, simple mask preparation and short exposure time, and provides an effective way for low-cost and high-efficiency preparation of periodic micro-nano structures.