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许多年来VLSI 设计中的“十进规则”一直支配着允许的最大颗粒尺寸,例如对1.5μm 的设计,要求其颗粒不得大于0.15μm.Dr.Lou Sarto 说“为了消除致命的缺陷,随着半导体器件线宽的缩小更有必要检测愈来愈小的粒子沾污”.但是,当超纯水中允许的粒子尺寸和其总数急剧下降时,粒子数的计数和对超纯水质的评价也日益困难.颗粒的来源众所周知,超纯水中所含的杂质有细菌、无机离子、总有机碳、SiO_2和微粒等.半导体器件加工的各步所使用
For decades, the “Decimal Rules” in VLSI design have dominated the maximum particle size allowed, for example for a design of 1.5μm requiring no more than 0.15μm particles.Dr.Lou Sarto said “In order to eliminate fatal flaws, as semiconductors It is even more necessary to reduce the line width of the device to detect smaller and smaller particle contamination. ”However, when the size and total number of particles allowed in ultrapure water drops precipitously, counting of particles and evaluation of ultrapure water quality Difficulty. The source of particles As we all know, the impurities contained in ultrapure water are bacteria, inorganic ions, total organic carbon, SiO 2 and particles, etc. Steps used in the processing of semiconductor devices