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集成电路正在从大规模集成电路(LSI)发展到集成度更高的超大规模集成电路(超LSI)上来,尘埃问题是这些半导体制造工厂的最大问题之一。在超LSI的制造过程中,提出了以0.1微米尘埃为对象的要求洁净度更高的洁净室。为适应这种要求,近年来研制了对0.1～0.17微米尘埃具有99.99％以上捕集效率的高效空气过滤器和0.1微米垂直层流10级模型洁净室。一、0.1微米尘埃粒子的计数(略) 二、捕集0.1微米尘埃用高效空气过滤器
Integrated circuits are moving from large-scale integrated circuits (LSIs) to ultra-large-scale integration (ultra-LSI) integrated circuits. Dust problems are one of the biggest problems in these semiconductor manufacturing plants. In the manufacturing process of the super LSI, a clean room requiring higher cleanliness is proposed for 0.1 micron dust. In order to meet this requirement, high-efficiency air filters with a trapping efficiency of 99.99% or more for 0.1 to 0.17 micron dust and a 10 level model clean room of 0.1 micron vertical laminar flow have been developed in recent years. First, the number of 0.1 micron dust particles (abbreviated) Second, trapping 0.1 micron dust with high efficiency air filter