Ag/[BN/Copt]5/Ag and [BN/Ag/CoPt]5/Ag thin films were deposited on glass substrates by magnetron sputtering and then annealed in vacuum at 600℃ for 30 min.The
Tantalum nitride and tantalum carbide films were fabricated using magnetron sputtering of tantalum followed by nitrogen and carbon plasma-based ion implantation