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合成了光致产酸剂N-对甲苯磺酸酯马来酰亚胺(TsOMI),及其与十二烷基甲基丙烯酰胺(DDMA)、对叔丁氧基苯乙烯碳酸酯(t-BOCSt)聚合得到三元共聚物。研究了该聚合物分子在气/液界面的成膜性,LB膜的光敏性和光刻性能。结果表明:该聚合物分子可在不同材质的基板上制备规整均匀的LB膜,在250nm紫外光照下,LB膜表现出化学增幅作用。以40层该聚合物LB膜为抗蚀层,经紫外曝光20min、显影10s后可得到分辨率为0.75μm(该掩膜所能达到的最大分辨率)的正型LB膜图形,进一步刻蚀得到分辨率为0.75μm的金膜图形。
The photoacid generator N-p-toluenesulfonate maleimide (TsOMI) was synthesized and its interaction with dodecylmethacrylamide (DDMA), p-tert-butoxystyrene carbonate (t- BOCSt) to obtain a terpolymer. The film formation properties of the polymer molecules at the gas / liquid interface and the photosensitivity and lithography properties of LB films were investigated. The results show that the polymer molecules can be prepared on the substrate of different materials regular and uniform LB film, under 250nm UV light, LB film showed chemical amplification. With 40 layers of the polymer LB film as a resist, the positive LB film with a resolution of 0.75 μm (the maximum resolution that can be achieved by the mask) was obtained after being exposed to ultraviolet light for 20 minutes and developed for 10 seconds. Further etching A gold film pattern with a resolution of 0.75 μm was obtained.