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在特定的工艺条件下 ,光刻胶的非线性效应非常显著 ;合理地利用非线性效应 ,能够制作出近似矩形的全息光栅掩模。为了分析清楚非线性效应对光栅沟槽成形的作用机理 ,有必要建立一个显影理论模型。模拟得到的光栅轮廓和实验样片的扫描电子显微镜照片结果很吻合。根据这个模型 ,进而使用光栅严格理论 ,得到其主要特征与实时监测实验曲线一致的理论模拟监测曲线。理论分析和实验证实 ,该模型基本表征了工艺条件对光栅沟槽形状的影响 ,并揭示了光刻胶呈现显著非线性效应时 ,必然对应着明暗条纹中心位置之间的显影刻蚀速率相差很大。这个模型为全息光栅的工艺研究提供了一个有效的理论分析工具。
Under certain technological conditions, the non-linear effect of photoresist is very significant; reasonable use of non-linear effects, can produce a nearly rectangular holographic grating mask. In order to analyze clearly the mechanism of action of nonlinear effect on grating groove formation, it is necessary to establish a theoretical model of development. The simulated grating profile is in good agreement with the scanning electron micrograph of the experimental sample. According to this model, and then use the grating strict theory, the main characteristics of simulation and real-time monitoring experimental curve of the theoretical simulation monitoring curve. The theoretical analysis and experiments show that the model basically characterizes the influence of the process conditions on the shape of the grating grooves and reveals that when the photoresist exhibits a significant nonlinear effect, the developing etch rates inevitably correspond to the difference between the center of the light and dark stripes Big. This model provides an effective theoretical analysis tool for the research of holographic grating technology.