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Yoshida等人提出的惯性流体模型只能解释脉冲激光烧蚀制备纳米硅晶粒平均尺寸随环境气压的变化规律.在此模型基础上,考虑到烧蚀粒子的初始速度分布(Maxwell分布),得到了纳米硅晶粒尺寸分布的解析表达式,数值模拟结果与Yoshida等人在不同环境氦气压下制备样品的晶粒尺寸分布的实验统计数据基本相符.还利用修正后的模型对不同环境气体种类(氦、氖、氩)中制备的纳米Si晶粒尺寸分布进行了模拟,模拟结果与实验数据相符.结论可为实现纳米硅晶粒尺寸的均匀可控提供理论依据.
The inertial fluid model proposed by Yoshida et al. Can only explain the variation of the average size of nanocrystalline silicon grains with the ambient pressure by pulsed laser ablation. Based on this model, taking into account the Maxwell distribution of ablated particles, The analytical expression of the grain size distribution of nanosized silicon is basically consistent with the experimental data of the grain size distribution of Yoshida et al. At different ambient helium pressures. The modified model is also used to analyze the distribution of different ambient gas species (Helium, neon, argon), the simulation results are consistent with the experimental data.Conclusions can provide a theoretical basis for the uniform controllable size of nano-silicon particles.