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采用电子束蒸发方式制备了两种不同材料组合的分光膜,分别对其在波长1064 nm激光辐照下的损伤阈值进行了测试,用Alpha-Step 500台阶仪对破斑进行了深度测量。实验结果表明,破斑呈现出表面层的剥落和深坑破坏两种形态。表面层的剥落深度在一定范围内不随能量密度的变化而变化;深坑破坏深浅不一,是膜内缺陷融化、汽化及喷发的综合作用的结果,是损伤阈值降低的主要原因。
Two kinds of light-splitting films with different materials were prepared by electron-beam evaporation. The damage thresholds of the films were measured respectively under 1064 nm wavelength laser irradiation. Depth measurements were carried out by using an Alpha-Step 500 step analyzer. The experimental results show that there are two kinds of morphologies of the spots, such as spalling of the surface layer and destruction of deep pits. The peel depth of the surface layer does not change with the energy density within a certain range. The deep pits have different shattering effects, which is the result of the combined action of melting, vaporization and eruption of the defects in the film, which is the main reason for the reduction of the damage threshold.