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作者正在研制一种在直流方式下工作,可输出离子束截面很大的金属气化真空弧(以下简称Mevva)离子源。在初步试验中,采用一组直径为18cm的多孔吸出栅极,在吸出电压为9kV(由于离子电荷状态的分布,离子能量约为18keV时,产生了束流约为0.6A的直流钛离子束。另外,作者还利用一个脉冲式等离子体枪,从直径为50cm(面积为2000cm~2)的栅极组获得离子束,这种配置方式能够非常有效地利用等离子体,在吸出电压为50kV(平均离子能量约为100keV)时,引出的束流可达7A,束的直径为33cm(FWHM),束脉冲的超调部份可达20A。本文将介绍Mevva研制规划中的直流宽束Mevva离子源的研制工作概况以及迄今所获得的研制成果。
The author is working on a direct current mode, which can output a metal vaporized vacuum arc (hereinafter referred to as Mevva) ion source with a large ion beam cross section. In a preliminary experiment, a set of porous suction grids with a diameter of 18 cm was used at an extraction voltage of 9 kV (ionized state of ion energy of about 18 keV resulted in a DC Ti ion beam having a beam current of about 0.6 A In addition, the authors also used a pulsed plasma gun to obtain an ion beam from a grid set of 50 cm in diameter (2000 cm ~ 2 in area), which was able to utilize the plasma very efficiently at a pumping voltage of 50 kV Average ion energy of about 100keV), the outgoing beam current up to 7A, beam diameter of 33cm (FWHM), beam pulse overshoot part of up to 20A.This article will introduce Mevva development plan DC wide beam Mevva ion A summary of the source of research and development and the research results so far obtained.