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与机械加工相比,电化学加工技术具有无刀具磨损、无热效应、无机械损伤、加工效率高等优点,而且适用于柔性、脆性及超硬材料,具备传统方法难以实现的复杂结构加工能力,因而在航空航天、汽车、微电子等领域有着重要应用,日益成为一种重要的工业制造技术.随着超大规模集成电路(ULSI)、微机电系统(MEMS)、微全分析系统(μ-TAS)、现代精密光学系统等高技术产业的迅速发展,功能性结构/器件的微型化和集成化的要求越来越高.由于传统电化学只适用于金属材料,为了应对微纳制造的时代要求,拓展电化学加工的材料普适性,1992年田昭武院士提出了具有我国自主知识产权的约束刻蚀剂层技术(CELT).一般的,约束刻蚀包括3个步骤:(1)通过电化学、光化学或光电化学的方法在模板电极表面生成刻蚀剂;(2)通过后续的均相化学反应或自由基衰变反应将刻蚀剂约束在微/纳米厚度的液层内;(3)将模板电极逼近加工基底,当约束刻蚀剂层接触被加工基底时,通过刻蚀反应实现微纳加工.最近,联合课题组通过仪器、原理和方法3个方面的努力,引入外部物理场调制技术,实现一维铣削、二维抛光、三维微/纳结构加工,大幅提升了CELT的技术水平.
Compared with machining, electrochemical machining technology has the advantages of no tool wear, no thermal effect, no mechanical damage and high processing efficiency, and is suitable for flexible, brittle and super-hard materials, and has the complicated structural processing capability that is difficult to be achieved by the traditional method. Therefore, (ULSI), micro-electromechanical system (MEMS), micro-total analysis system (μ-TAS), and so on, have been widely used in aerospace, automotive and microelectronics fields, , Modern high-precision optical systems and other high-tech industries, the rapid development of functional structure / device miniaturization and integration requirements are getting higher and higher.As the traditional electrochemical only applies to metal materials, in order to meet the requirements of the era of micro-nano manufacturing, In 1992, Academician Tian Zhaowu proposed a constrained etchant layer technology (CELT) with independent intellectual property rights in China.Generally, constrained etching includes three steps: (1) Electrochemical , Photochemical or photoelectrochemical methods to generate etchants on the surface of the template electrode; (2) constraining the etchant to the micro / nano-scale by subsequent homogeneous chemical reaction or radical decay reaction; M thick liquid layer; (3) the template electrode is approached to the processing substrate, when the constrained etchant layer contacts the substrate to be processed, the micro-nano processing is achieved through an etching reaction, and the joint research group recently adopted instruments, principles and methods The efforts to introduce external physical field modulation technology to achieve one-dimensional milling, two-dimensional polishing, three-dimensional micro / nano structure processing, significantly enhance the technical level of CELT.