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采用离子束溅射方法在单晶Si(100)基片上沉积厚度为100nm的Al2O3薄膜,利用原子力显微镜、X射线光电子能谱、掠入射衍射等微观分析手段,研究了薄膜的表面形貌、粗糙度、成分,及退火后微观结构的变化。研究表明:室温沉积在基片上的纳米薄膜为非晶态,纳米颗粒为无方向性沉积,颗粒呈团球状,其成分基本满足Al2O3的标准成分配比。850℃×6h退火处理后,生成晶态的-γAl2O3,薄膜表面结晶完整,颗粒清晰可见。
Al 2 O 3 thin films with a thickness of 100 nm were deposited on single-crystal Si (100) substrates by ion-beam sputtering. The surface morphology, rough surface morphology and surface roughness of the films were studied by means of microanalysis such as atomic force microscopy, X-ray photoelectron spectroscopy and grazing incidence diffraction. Degree, composition, and microstructure changes after annealing. The results show that the nanofilm deposited on the substrate at room temperature is amorphous, the nanoparticles are non-directional deposition and the particles are globular in shape, and their compositions basically meet the standard compositional proportions of Al2O3. After annealed at 850 ℃ for 6h, crystalline γ-Al2O3 was formed, the surface of the film was completely crystallized and the particles were clearly visible.