采用离散点曝光方式来制作微型构造物的光固化快速成型法 ,其成型时间长 ,这一问题是制约微型光固化快速成型技术迅速推广应用的主要因素之一。为探索解决此问题的途径 ,提出了掩膜成型方案 ,设计制作了实验装置 ,用该装置制作了掩膜 ,并利用此掩膜进行了光固化实验。结果表明 ,此方案可大幅缩短成型时间 ,是解决成型效率问题的有效途径之一 It is one of the main factors restricting the rapid popularization and application of micro-light-curing rapid prototyping technology that the discrete-point exposure method is used to make the micro-structure rapid prototyping. In order to explore ways to solve this problem, a mask forming scheme was proposed, an experimental device was designed and fabricated, a mask was made by the device, and a photo-curing experiment was conducted by using the mask. The results show that this method can greatly shorten the molding time, which is an effective way to solve the problem of forming efficiency