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SEMICON China 2004期间,国际知名晶圆清洗设备制造厂商FSI公司适时地连续在上海和台湾召开了“FSI表面处理技术研讨会” 与“针对65纳米制程的尖端清洗技术”研讨会,与客户共同分享FSI的成果及听取客户的意见,以达到共赢之目的。借此机会,我们采访了来自美国的FSI公司董事长兼首席执行官Donald Mitchell先生,请他介绍FSI公司及所取得的成果。
During the SEMICON China 2004, FSI, a world-renowned manufacturer of wafer cleaning equipment, held a series of seminars on “FSI Surface Treatment Technology” and “Advanced Cleaning Technology for 65nm Process” in Shanghai and Taiwan in a timely manner, sharing with customers FSI's achievements and listen to the views of customers in order to achieve a win-win situation. In this opportunity, we interviewed Mr. Donald Mitchell, chairman and chief executive officer of FSI Corporation from the United States, and asked him about FSI's company and its achievements.