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利用脉冲激光沉积技术在Ti6Al4V(TC4)合金表面制备了羟基磷灰石(HA)薄膜,研究了退火温度对薄膜组织和性能的影响。采用扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射(XRD)和傅里叶红外光谱(FTIR)等分析手段对热处理前后薄膜的表面形貌、成分和组织结构进行了分析;采用轮廓仪、接触角测量仪分别对热处理前后薄膜的表面粗糙度和润湿性进行了测量。实验结果表明,利用脉冲激光沉积技术制备的HA薄膜致密、无缺陷,主要由非晶相组成。热处理后的薄膜结晶度提高、表面粗糙度增大,Ca/P比更接近于HA,具有更好的表面亲水性。但是过高的热处理温度(700℃)会导致薄膜中微裂纹的出现。
The hydroxyapatite (HA) thin films were prepared on the surface of Ti6Al4V (TC4) alloy by pulsed laser deposition. The effects of annealing temperature on the microstructure and properties of the films were studied. The surface morphology, composition and microstructure of the films before and after heat treatment were analyzed by means of SEM, EDS, XRD and FTIR. The surface roughness and wettability of the films before and after heat treatment were measured by profiler and contact angle measuring instrument. The experimental results show that the HA thin films prepared by pulsed laser deposition are dense and defect-free, and mainly consist of amorphous phase. After heat treatment, the crystallinity of the film increases, the surface roughness increases, and the Ca / P ratio is closer to HA, resulting in better surface hydrophilicity. However, excessive heat treatment temperature (700 ℃) will lead to the appearance of micro-cracks in the film.