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本文采用微波驱动韵等离子体化学气相沉积方法,以CH_3OH+H_2以及CH_3COCH_3+H_2作为原料气体,在单晶Si(111)面和石头上制成了直径≥20mm,厚度≥20μm的优质多晶金刚石薄膜,在SDA级及毫米级高压金刚石单晶颗粒的外露面上成功地外延出了单晶金刚石薄膜层。实验中经扫描电镜测试发现,在不同的实验条件下,生长层的形貌不同,而且通过拉
In this paper, a microwave-driven rhyme plasma chemical vapor deposition method was used to produce high quality polycrystalline diamond with diameter≥20mm and thickness≥20μm on single-crystal Si (111) surface and with CH_3OH + H_2 and CH_3COCH_3 + H_2 as raw material gases Film, a single-crystal diamond thin film layer was successfully epitaxized on the exposed surfaces of SDA grade and mm-level high-pressure diamond single crystal particles. The experiment by scanning electron microscopy showed that under different experimental conditions, the morphology of the growth layer is different, and by pulling