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本文用ANSYS软件对新型的45°双弯曲磁过滤阴极真空电弧沉积系统中的磁场分布进行了模拟计算,并结合等离子体传输和电弧源弧斑运行稳定性进行了分析。在建立的数学模型基础上,分别研究了磁过滤弯管磁场空间分布对拟定的不同出射方向上的111个碳离子束的传输行为影响,和外加永久磁体对电弧源附近磁场空间分布的影响。结果表明,在优化的磁过滤弯管磁场空间分布情况下,111个碳离子束流可全部通过磁过滤弯管,并高效传输到基材表面。当电弧靶源后部的外加永久磁体磁化方向与弯管上的磁化方向相反,且磁矫顽力大于600 kA/m时,阴极靶弧源附近的磁力线空间分布更利于控制阴极弧斑长时间运行稳定性,这对延长弧斑寿命、提高等离子体的沉积效率、提高靶材表面刻蚀均匀性和获得高性能的ta-C薄膜生长具有重要理论意义。
In this paper, the magnetic field distribution in a new type of 45 ° double curved magnetic-filtered cathodic vacuum arc deposition system was simulated by ANSYS software, and the plasma transmission and arc-source arc spot operation stability were analyzed. Based on the mathematical model, the influence of magnetic field distribution on the transmission behavior of 111 carbon ion beams in different exit directions and the influence of applied permanent magnet on the magnetic field distribution near the arc source were studied respectively. The results show that in the optimized spatial distribution of magnetic field, the flow of 111 carbon ions can all pass through the magnetic filter elbow and be efficiently transported to the substrate surface. When the direction of magnetization of the applied permanent magnet behind the arc source is opposite to that on the elbow and the magnetic coercive force is greater than 600 kA / m, the spatial distribution of the magnetic flux in the vicinity of the cathode target arc source is more conducive to control the arc arc spot for a long time It has important theoretical significance to extend the service life of the arc spot, improve the deposition efficiency of the plasma, improve the etching uniformity of the target surface and obtain the high-performance ta-C thin film growth.