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美国光学镀膜实验室(OCLI)先进产品部最近宣布研制成厚膜镀制工艺,用这种工艺生产的单片电介质薄膜厚度可达100μm。正用作标准具滤光片的间隔
The Advanced Coatings Division of the American Optical Coating Laboratory (OCLI) recently announced the development of a thick film plating process using a monolithic dielectric film thickness of up to 100 μm. Is used as a standard filter interval